SKU:15101155445
Cu Film on Ta/Silicon Wafer, Cu=100 nm Ta=20nm,,Si(100) B-doped ,10x10x0.525mm,R:1-20 ohm.cm, 1sp
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Ships within 48 hours · Estimated delivery Jul 13 - Jul 18
Description
Cu Film on Ta/Silicon Wafer, Cu=100 nm Ta=20nm,,Si(100) B-doped ,10x10x0.525mm,R:1-20 ohm.cm, 1spSpecifications: Cu coated Si Wafer ( 10x10 mm size ) Thickness of highly oriented polycrystalline Cu <111> film: 100 nm Thickness of Ta diffusion barrier: 20 50 nm 0. 525 mm thickness Si wafer (Prime Grade) P type, B doped, <100> orientation, SSP Resistivities: 1 20 ohm cm Surface Roughness: as grown , RA < 10 nm Package: One 1000 class clean room with 100 class plastic bag 10 pcs per package for minimum order
YLJ-24TS has a transparent protection shield and separate manual hydraulic pump
and vacuum Flanges
A Multi-channel Syringe Pump System (Pic
F=P_(Gauge Displayed Pressure Value (GDPV)) ×S_(Cross-section area of the inside piston)
it is necessary to use dry or alcohol-based tool lubricant to lubricate the die and sleeve set to reduce friction during the compression
must do Grounding tests(GFCI) before first-time use
A high voltage power supply (Pic 2)
Shipped in a vacuum bag
With real-time monitoring windows and integrated graph/data windows
The time settings of the temperature controller are in seconds
Thickness: 11 um
Surface Polishing: one side optical polished
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